Laser scanning interferometric surface metrology
US7405831B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2006 |
| Grant date | Jul 29, 2008 |
| Priority date | — |
| Expiry date | Feb 1, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/111666
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for assessing topology of a surface of a target including an optical source for generating a probe laser beam. The apparatus also includes a means for scanning the probe laser beam across at least a portion of the surface of the target and a beamsplitter for redirecting a return signal toward the means for detecting the return signal in a substantially quadrature condition. A quadrature interferometric method for determining the presence or absence of a target analyte in a sample comprising a laser probe beam having a wavelength λ and a waist wo to probe at least a portion of a substrate having a reflecting surface that includes at least a first region having a layer of recognition molecules specific to the target analyte and a second region that does not include a layer of recognition molecules specific to the target analyte.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.