Method for the production of photoresist structures
US7407737B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2003 |
| Grant date | Aug 5, 2008 |
| Priority date | — |
| Expiry date | May 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2250/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2), which are superposed inside the photosensitive material (5), and is subsequently subjected to a developing process, wherein the light beams (1, 2) penetrate at least one transparent optical element (3).The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction for the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without optical element (3).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.