Metallisation
US7410900B2 · kind B2 · utility
1Cited by
3References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 18, 2003 |
| Grant date | Aug 12, 2008 |
| Priority date | — |
| Expiry date | Jun 19, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C26/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention relates to photosensitive organometallic compounds which are used in the production of metal deposits. In particular, this invention relates to photosensitive organometallic compounds such as bis-(perfluoropropyl)-1,5-cyclooctadiene platinum (II) (i.e. (C3F7)2PtC8H12) which on exposure to UV radiation and then a reduction process forms a platinum metal deposit such as a substantially continuous thin ‘sheet-like’ film or a substantially narrow line which is capable of electrical conduction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.