Polarized UV exposure system
US7413317B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2004 |
| Grant date | Aug 19, 2008 |
| Priority date | — |
| Expiry date | Aug 20, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light exposure system is used to expose an alignment layer formed of anistropically absorbing molecules so as to allow alignment of subsequently applied liquid crystal polymer (LCP) molecules. The light incident on the alignment layer is polarized. When a single polarizer is used, the azimuthal polarization direction varies across the substrate carrying the alignment layer. Various approaches to reducing the azimuthal polarization variation may be adopted, including the introduction of various types of polarization rotation reduction element and in selecting an appropriate tilt angle for the light source. Furthermore, a reflective structure may be inserted between the light source and the alignment layer. Use of the reflective structure increases the total amount of light incident on the alignment layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.