Method for controlled application of reactive vapors to produce thin films and coatings
US7413774B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2004 |
| Grant date | Aug 19, 2008 |
| Priority date | — |
| Expiry date | May 19, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/142
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.