Lithograph with one-dimensional trigger mask and method of producing digital holograms in a storage medium
US7413830B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2002 |
| Grant date | Aug 19, 2008 |
| Priority date | — |
| Expiry date | Dec 28, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2001/0478
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a method of producing digital holograms in a storage medium, in which the technical problem of writing computer-generated holograms by means of optical lithography as quickly as possible and with little effort with simultaneous accurate control of the timed triggering and the positioning of the write beam is achieved in that a write beam is focused onto the storage medium and moved one-dimensionally relative to the storage medium, in that a scanning beam is focused onto a trigger mask having a plurality of trigger lines and moved one-dimensionally transversely relative to the trigger lines, the movement of the scanning beam being coupled with the movement of the write beam, in that, during the scanning of the trigger lines, a timed trigger signal is generated as a function of the arrangement of the trigger lines, in that, with the aid of the timed trigger signal, the intensity of the write beam on the storage medium is controlled, and in that the hologram is written line by line by introducing radiation energy point by point, the storage medium being displaced transversely with respect to the scanning direction of the lines by a predefined distance …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.