EUV radiation source with high radiation output based on a gas discharge
US7414253B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2006 |
| Grant date | Aug 19, 2008 |
| Priority date | — |
| Expiry date | Mar 20, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0035
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.