Method of fabricating a magnetic shift register
US7416905B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2005 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Jul 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C19/0841
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A magnetic data track used in a magnetic shift register memory system may be fabricated by forming a multilayered stack of alternating dielectric and/or silicon layers. A trench is etched in the multi-layer stack structure. A selective etching process is used to corrugate the walls of trench. A seed layer is applied to the walls and bottom of the trench; the seed layer is covered with a magnetic layer. The trench is filled with an insulating material. A patterned layer is applied and portions of insulating material exposed by the pattern are removed, forming holes. Magnetic material and seed layer exposed in holes is selectively removed. The holes are filled with insulating material and connecting leads are attached to data tracks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.