Method for fabricating a micro structure
US7416908B2 · kind B2 · utility
3Cited by
6References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 2006 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Sep 2, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2201/042
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for fabricating a micro structure includes depositing a first layer of a first material over a substrate; patterning a first hard mask over the first layer; depositing a second layer of a second material over the first layer and the first hard mask; patterning a second hard mask over the second layer; and selectively removing the first material and the second material not covered by any of the first mask and the second mask to produce over the substrate the micro structure having a first structure portion having a first height and a second structure portion having a second height.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.