Method and apparatus for inducing an index of refraction change on a substrate sensitive to electromagnetic radiation
US7418162B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 1, 2007 |
| Grant date | Aug 26, 2008 |
| Priority date | — |
| Expiry date | Mar 27, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/02133
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for inducing of the index of refraction of a substrate sensitive to electromagnetic radiation. The apparatus is capable of generating a first beam of electromagnetic radiation and a second beam of electromagnetic radiation that is different from the first beam. The first and the second beams converge toward a treatment area on the substrate, which is illuminated with electromagnetic radiation. The first beam and the second beam interact to create an interference pattern over a limited portion of the treatment area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.