Method and system for providing a smaller critical dimension magnetic element utilizing a single layer mask
US7419891B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2006 |
| Grant date | Sep 2, 2008 |
| Priority date | — |
| Expiry date | Mar 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3909
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The method and system for providing a magnetic element are disclosed. The method and system include providing a magnetic element stack that includes a plurality of layers and depositing a stop layer on the magnetic element stack. The method and system also include providing a dielectric antireflective coating (DARC) layer on the stop layer, forming a single layer mask for defining the magnetic element on a portion of the DARC layer, and removing a remaining portion of the DARC layer not covered by the single layer mask. The portion of the DARC layer covers a portion of the stop layer. The method further includes removing a remaining portion of the stop layer and defining the magnetic element using at least the portion of stop layer as a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.