Sapphire alignment fixture
US7421795B2 · kind B2 · utility
3Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2006 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | Nov 24, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B5/0004
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology system comprises a support structure, a fixture having a bottom surface resting on a surface of the support structure and moveable relative to the support structure, and a first measurement assembly for interacting with a workpiece held by the fixture to measure a characteristic of the workpiece. One of the bottom surface of the fixture and the surface of the support structure comprises sapphire, and the other of the bottom surface of the fixture and the surface of the support structure comprises a metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.