Method for marking defect and device therefor
US7423744B2 · kind B2 · utility
3Cited by
17References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2006 |
| Grant date | Sep 9, 2008 |
| Priority date | — |
| Expiry date | Oct 24, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/89
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A defect marking device includes a flaw inspection device which has a plurality of light-receiving parts that identify reflected lights coming from an inspection plane of a metal strip under two or more of optical conditions different from each other; a signal processing section that judges the presence/absence of surface flaw on the inspection plane based on a combination of reflected light components identified under these optical conditions different from each other; and a marking device which applies marking that indicates information relating to the flaw on the surface of the metal strip.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.