Anti-reflection optical data storage disk master
US7427466B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 29, 2004 |
| Grant date | Sep 23, 2008 |
| Priority date | — |
| Expiry date | Apr 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/261
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques described herein can improve resolution of the features created on the master by reducing mastering noise. The techniques include depositing a multi-layer structure adjacent a master substrate layer. The multi-layer structure includes an etch stop layer, an etch layer, and a photoresist layer. A thickness of each of the layers is selected to generate substantially no reflectivity for at least one interface of the multi-layer structure to substantially eliminate stray light effects. The photoresist layer defines a portable conformable mask (PCM) for the etch layer. The etch layer is etched through the contact mask to define a feature of the master in the etch layer. The etch stop layer thickness may be selected to be as thin as possible to reduce surface roughness of the multi-layer structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.