Patent · US Expired

Method of activating a silicon surface for subsequent patterning of molecules onto said surface

US7427477B2 · kind B2 · utility

0Cited by

3References

41Claims

0Family size

Assignee

Sony Deutschland GmbH · DE

Inventors

Jurina Wessels · Stuttgart, DE
William Ford · Stuttgart, DE
Akio Yasuda · Eßlingen, DE

Key dates

Filing date	Dec 3, 2004
Grant date	Sep 23, 2008
Priority date	—
Expiry date	Nov 24, 2025

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/24802
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

The present invention relates to a method of activating a silicon surface for subsequent patterning of molecules onto said surface, and to patterns produced by this method, and further to uses of said pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.