Deposited thin films and their use in separation and sacrificial layer applications
US7427526B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2001 |
| Grant date | Sep 23, 2008 |
| Priority date | — |
| Expiry date | May 20, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49108
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This invention uses large surface to volume ratio materials for separation, release layer, and sacrificial material applications. The invention outlines the material concept, application designs, and fabrication methodologies. The invention is demonstrated using deposited column/void network materials as examples of large surface to volume ratio materials. In a number of the specific applications discussed, it is shown that it is advantageous to create structures on a laminate on a mother substrate and then, using the separation layer material approach, to separate this laminate from the mother substrate using the present separation scheme. It is also shown that the present materials have excellent release layer utility. In a number of applications it is also shown how the approach can be used to uniquely form cavities, channels, air-gaps, and related structures in or on various substrates. Further, it is demonstrated that it also can be possible and advantageous to combine the schemes for cavity formation with the scheme for laminate separation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.