Electron beam apparatus
US7427826B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2006 |
| Grant date | Sep 23, 2008 |
| Priority date | — |
| Expiry date | May 27, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J31/127
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
There provided is an electron beam apparatus of preventing surface creeping discharge from newly arising due to discharge that arises between an anode electrode and an electron-emitting device. In an electron-emitting device including a scan signal device electrode and an information signal device electrode, a portion of the scan signal device electrode is covered by an insulating layer of insulating scan signal wiring from information signal wiring, an additional electrode is connected to the scan signal device electrode at an end portion of the insulating layer and the additional electrode is configured so that energy Ee being lost due to melting of the additional electrode is larger than energy Ea of discharge current flowing in to the electron-emitting device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.