Method of forming a coating film
US7429405B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2003 |
| Grant date | Sep 30, 2008 |
| Priority date | — |
| Expiry date | Dec 1, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/34
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for forming a coating film at part of a surface of a substrate includes, in sequence, a first step of applying a masking agent having inert particles over part of the substrate through a screen having blocked areas, a second step of depositing the coating film under at least partial vacuum over at least part of the surface covered and not covered by the masking agent, and a third step of removing the masking agent covered by the film with the aid of an aqueous fluid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.