Signal processing method and apparatus for use in real-time subnanometer scale position measurements with the aid of probing sensors and beams scanning periodically undulating surfaces such as gratings and diffraction patterns generated thereby, and the like
US7430484B2 · kind B2 · utility
17Cited by
3References
27Claims
0Family size
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Key dates
| Filing date | Mar 31, 2006 |
| Grant date | Sep 30, 2008 |
| Priority date | — |
| Expiry date | Dec 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q10/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved signal processing method and apparatus are presented for use in real-time sub-nanometer scale position measurements with the aid of probing sensors and/or beams scanning periodically undulating surfaces such as a grating and diffraction patterns generated thereby, and the like, enabling greater sub-nanometer precision, higher stage scanner movement speeds, and simultaneous high accuracy and top speed measuring capabilities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.