Process and apparatus for organic vapor jet deposition
US7431968B1 · kind B1 · utility
1,190Cited by
12References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2002 |
| Grant date | Oct 7, 2008 |
| Priority date | — |
| Expiry date | Mar 8, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/24
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device includes a source of organic vapors, a source of carrier gas and a vacuum chamber. A heated nozzle block attached to the source of organic vapors and the source of carrier gas has at least one nozzle adapted to eject carrier gas and organic vapors onto a cooled substrate disposed within the vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.