Chemical vapor deposition of hydrogel films
US7431969B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 5, 2005 |
| Grant date | Oct 7, 2008 |
| Priority date | — |
| Expiry date | Apr 10, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/60
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
In one embodiment of the invention, iCVD is used to form linear thin films using a radical initiator and an alkene. In another embodiment, iCVD is used to form crosslinked thin films by the addition of a crosslinking agent (e.g., a diacrylate or a dimethyacrylate). The incorporation of a crosslinking agent into the thin films is shown to increase systematically with its partial pressure. In one embodiment, when the crosslinker is EDGA and the monomer is HEMA it results in crosslinked P(HEMA-co-EGDA) copolymer. In another embodiment, when the crosslinker is EDGA and the monomer is VP, it results in crosslinked P(VP-co-EGDA). Disclosed are the effects of crosslinker incorporation on the thermal and the wetting properties of the polymers. The unique swelling properties of these films are also described; certain films of the present invention are hydrogels when soaked in water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.