Processes and devices using polycyclic fluoroalkanes in vacuum and deep ultraviolet applications
US7435528B2 · kind B2 · utility
2Cited by
2References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 9, 2005 |
| Grant date | Oct 14, 2008 |
| Priority date | — |
| Expiry date | Jun 29, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.