Patent · US Expired

Method of fabricating an optoelectronic device having a bulk heterojunction

US7435617B2 · kind B2 · utility

18Cited by
25References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 30, 2004
Grant dateOct 14, 2008
Priority date
Expiry dateOct 21, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method of fabricating an optoelectronic device comprises: depositing a first layer having protrusions over a first electrode, in which the first layer comprises a first organic small molecule material; depositing a second layer on the first layer such that the second layer is in physical contact with the first layer; in which the smallest lateral dimension of the protrusions are between 1 to 5 times the exciton diffusion length of the first organic small molecule material; and depositing a second electrode over the second layer to form the optoelectronic device. A method of fabricating an organic optoelectronic device having a bulk heterojunction is also provided and comprises: depositing a first layer with protrusions over an electrode by organic vapor phase deposition; depositing a second layer on the first layer where the interface of the first and second layers forms a bulk heterojunction; and depositing another electrode over the second layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.