System and method for detecting repeating defects in a light-management film
US7435986B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2006 |
| Grant date | Oct 14, 2008 |
| Priority date | — |
| Expiry date | Dec 12, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/9513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and a method for detecting defects in a light-management film are provided. The system includes a first light source configured to emit light onto a first side of the film in a first predetermined region of the film. The system further includes a second light source configured to emit light onto a second side of the film in the first predetermined region of the film. The system further includes a first camera configured to receive a first portion of light reflected from the first predetermined region of film from the first light source and a second portion of the light propagating through the film from the second light source. Finally, the system includes a signal-processing device openably coupled to the first camera configured to detect a defect in the first predetermined region of the film based on at least one of the first and second portions of light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.