Highly-sensitive displacement-measuring optical device
US7440117B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2006 |
| Grant date | Oct 21, 2008 |
| Priority date | — |
| Expiry date | Apr 20, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04R23/008
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device further includes a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an electrode extending toward, but spaced a distance away from, the second region of the mechanical structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.