Dual source XRF system
US7440541B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2006 |
| Grant date | Oct 21, 2008 |
| Priority date | — |
| Expiry date | Feb 4, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A dual source tube XRF system and method wherein a first x-ray source is employed to direct x-rays in a first energy band at a sample and at least a second x-ray source is employed to direct x-rays in a second energy band at the sample. A detector is responsive to x-rays emitted by the sample after irradiation by the first and second x-ray sources. An analyzer is responsive to the detector and is configured to determine the amount of at least a first substance in the sample based on irradiation of the sample by the first x-ray source and to determine the amount of at least a second substance in the sample based on irradiation of the sample by the second x-ray source. A controller is responsive to the analyzer and is configured to energize the first and second x-ray sources either simultaneously or sequentially.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.