Methods, systems, and polymer substances relating to consideration of H2O levels present within an atmospheric-pressure nitrogen dielectric-barrier discharge
US7442442B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 1, 2004 |
| Grant date | Oct 28, 2008 |
| Priority date | — |
| Expiry date | Mar 29, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31938
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods and systems utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances. The atmospheric-pressure nitrogen dielectric-discharge may be maintained with a level of H2O below a pre-defined amount, such as by measuring and controlling the H2O within a treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the H2O level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles such as by controlling the H2O level within the treater based on these analyses of the treated polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.