Method of treating surface of substrate used in biological reaction system
US7442503B2 · kind B2 · utility
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2Claims
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Key dates
| Filing date | Jan 27, 2004 |
| Grant date | Oct 28, 2008 |
| Priority date | — |
| Expiry date | Mar 24, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2203/35
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Provided is a method of treating a surface of a substrate used in a biochemical reaction system, the method including forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below:(RO)3—Si—(CH2)n1—X (1)(RO)3—Si—(CH2)n2—(CF2)m—X (2)wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.