Method and apparatus for inspecting a mura defect, and method of manufacturing a photomask
US7443498B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 27, 2005 |
| Grant date | Oct 28, 2008 |
| Priority date | — |
| Expiry date | Jun 11, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A mura defect inspecting apparatus 10 inspects the mura defect occurring in a repetitive pattern which is on a photomask 50, and which has a large number of unit patterns that are regularly arranged. The apparatus has a light receiver 13, an analyzing device 14, and an evaluating device 15. The light receiver and the analyzing device detect the mura defect occurring in the repetitive pattern of the photomask. The evaluating device compares mura defect detection data of the mura defect of the photomask which are detected by the light receiver and the analyzing device, with plural pseudo mura defect detection data, thereby evaluating the mura defect of the photomask. The pseudo mura defect detection data are correlated respectively with plural pseudo mura defects to which intensities of mura defects occurring in a predetermined repetitive pattern are allocated with being stepwisely changed, for respective kinds of the mura defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.