Process and apparatus for forming nanoparticles using radiofrequency plasmas
US7446335B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2005 |
| Grant date | Nov 4, 2008 |
| Priority date | — |
| Expiry date | Jul 21, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/108
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10 nm may be fabricated in accordance with the methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.