Patent · US Expired

Process and apparatus for forming nanoparticles using radiofrequency plasmas

US7446335B2 · kind B2 · utility

23Cited by
9References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 17, 2005
Grant dateNov 4, 2008
Priority date
Expiry dateJul 21, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/108
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10 nm may be fabricated in accordance with the methods.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.