Surface modified stamper for imprint lithography
US7448860B2 · kind B2 · utility
5Cited by
29References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2007 |
| Grant date | Nov 11, 2008 |
| Priority date | — |
| Expiry date | Oct 9, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S425/81
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of performing imprint lithography of a surface substrate includes a stamper having a thin lubricant coating thereon to facilitate release of the stamper from the imprinted surface to reduce degradation of image replication. Embodiments of the invention include stampers suitable for use in patterning servo information on magnetic recording media having a lubricant coating of from about 1 nm to about 20 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.