Measuring device for the measurement of optical properties of coated substrates
US7450233B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 24, 2004 |
| Grant date | Nov 11, 2008 |
| Priority date | — |
| Expiry date | May 29, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/55
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measuring device includes several sequentially disposed coating chambers for measuring optical properties of coated substrates. These coating chambers are separated from one another by partitioning walls, whose free ends are located closely above the substrate. The substrate is preferably a continuous film. By measuring the reflection, the transmission, etc. of the substrate between the individual coating chambers, it becomes possible to carry out measurements within only partially completed layer systems. This yields advantages for the technical operation control of the coating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.