Method for fabricating a microscale anemometer
US7451537B2 · kind B2 · utility
22Cited by
9References
13Claims
0Family size
Assignee
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Key dates
| Filing date | May 18, 2005 |
| Grant date | Nov 18, 2008 |
| Priority date | — |
| Expiry date | Jan 23, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49083
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method for fabricating a microscale anemometer on a substrate. A sacrificial layer is formed on the substrate, and a metal thin film is patterned to form a sensing element. At least one support for the sensing element is patterned. The sacrificial layer is removed, and the sensing element is lifted away from the substrate by raising the supports, thus creating a clearance between the sensing element and the substrate to allow fluid flow between the sensing element and the substrate. The supports are raised preferably by use of a magnetic field applied to magnetic material patterned on the supports.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.