Chromatographic methods for measuring impurities in a gas sample
US7451634B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2006 |
| Grant date | Nov 18, 2008 |
| Priority date | — |
| Expiry date | Jun 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2030/8872
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An improved chromatographic method for measuring impurities in a gas sample that allows extraction of a peak of impurity masked by the sample background. An impurity peak is extracted from the sample background and put in a second sample loop and the second sample loop volume is injected into a second separation column. A “slice” is taken from the sample background to fill the second sample loop and the “slice”, whose width is preferably substantially equal to the impurities peak width, is injected into the second separation column. Another embodiment allows concentration of a predetermined impurity, thereby providing an improved precision on the results. The chromatographic method provides an improved measure of argon in oxygen, oxygen in argon and oxygen in hydrogen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.