Patent · US Active

Radiation-resistant zone plates and method of manufacturing thereof

US7452820B2 · kind B2 · utility

1Cited by
37References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 5, 2005
Grant dateNov 18, 2008
Priority date
Expiry dateJan 9, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B5/1857
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Disclosed are radiation-resistant zone plates for use in laser-produced plasma (LPP) devices, and methods of manufacturing such zone plates. In one aspect, a method of manufacturing a zone plate provides for forming a masking layer over a supporting membrane, and creating openings through the masking layer in a diffractive grating pattern. Such a method also provides depositing radiation absorbent material in the openings in the masking layer and on the supporting membrane, and then stripping the remaining portions of the masking layer. Then, portions of the supporting membrane not covered by the absorbent material are removed, wherein the remaining portions of the supporting membrane covered by the absorbent material form separate grates. Also in such methods, cross-members are coupled to the grates for holding positions of the grates with respect to each other.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.