Pulsed RF high pressure CO2 lasers
US7453918B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2006 |
| Grant date | Nov 18, 2008 |
| Priority date | — |
| Expiry date | Sep 5, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved laser system includes a sealed-off, RF excited, diffusion cooled, high pressure, short pulsed, high peak power waveguide and slab CO2 laser that avoids problems typically associated with obtaining a diffused discharge at high gas pressures, without arcing and without corona, while maintaining the unsaturated gain and gas temperature experienced at low pressures and scaling to higher pressures. Such a system has a long operating life-time, and is capable of operation at high gas pressures to obtain relative fast rise and fall time pulses. The system emits relatively short pulse widths, with pulse energies up to and exceeding 30 mJ, with reasonably high pulse repetition rates. The system also has a low pulsed RF power duty cycle, thereby enabling the generation of high peak power pulses, as well as reasonable average power and reasonably high peak powers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.