Polymer for heat-sensitive lithographic printing plate precursor

US7458320B2 · kind B2 · utility

Assignee

• AGFA GRAPHICS NV · BE

Inventors

• Bert Groenendaal · Sinaai, BE
• Johan Loccufier · Zwijnaarde, BE
• Huub Van Aert · Pulderbos, BE
• Marc Van Damme · Heverlee, BE

Key dates

• Filing date: Sep 18, 2003
• Grant date: Dec 2, 2008
• Expiry date: Nov 4, 2023

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B41C2210/262
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

A polymer for a heat-sensitive lithographic printing plate precursor is disclosed wherein the polymer comprises a phenolic monomeric unit wherein the H atom of the hydroxy group of the phenyl group of the phenolic monomeric unit is replaced by a group comprising a N-imide group and wherein the substitution of the polymer increases the chemical resistance of the coating of the printing plate precursor.