Protection layers in micromirror array devices
US7459402B2 · kind B2 · utility
75Cited by
7References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2005 |
| Grant date | Dec 2, 2008 |
| Priority date | — |
| Expiry date | Jan 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.