Extreme UV radiation source device and method for eliminating debris which forms within the device
US7459708B2 · kind B2 · utility
7Cited by
3References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2006 |
| Grant date | Dec 2, 2008 |
| Priority date | — |
| Expiry date | Aug 22, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.