Multi-beam pitch adjusting apparatus and image forming apparatus
US7460145B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2007 |
| Grant date | Dec 2, 2008 |
| Priority date | — |
| Expiry date | Jun 4, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/473
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A multi-beam scanning apparatus includes a light source having first and second light source sections that hold a pair of semi-conductor laser diodes and coupling lenses that couple four beams irradiated from the pair of semi-conductor laser diodes with a base member. A light beam deviating device may be provided so as to deviate the four beams. A scan imaging device is also provided so as to scan a scan receiving surface with beam spots of the beams deviated by the light beam deviating device. A beam pitch-detecting device is also provided so as to detect a beam pitch of the respective beams formed on the scan-receiving surface. A beam pitch correcting device is provided in order to correct the beam pitch by causing relative deviation of a light axis among the respective beams on a sub scanning direction cross sectional plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.