Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
US7462659B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 14, 2004 |
| Grant date | Dec 9, 2008 |
| Priority date | — |
| Expiry date | Mar 17, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02282
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This invention is related to a reactive nanoparticular cyclodextrin derivative useful as a porogen and a low dielectric matrix, with excellent mechanical properties and uniformly distributed nanopores, manufactured by sol-gel reaction of the above reactive cyclodextrin. Furthermore, this invention also is related to an ultralow dielectric film, with uniformly distributed nanopores, a relatively high porosity of 51%, and a relatively low dielectric constant of 1.6, manufactured by thin-filming of the conventional organic or inorganic silicate precursor by using the above reactive nanoparticular cyclodextrin derivative as a porogen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.