Sealing mechanism for sealing a vacuum chamber
US7464941B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 25, 2005 |
| Grant date | Dec 16, 2008 |
| Priority date | — |
| Expiry date | Apr 20, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S277/927
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A sealing mechanism comprises a support member forming part of the semiconductor producing apparatus which has a vacuum chamber, a rotation shaft rotatably received in the support member, and at least three seal rings axially spaced apart from each other between the support member and the rotation shaft to form a first fluid chamber close to the atmosphere and a second fluid chamber close to the vacuum chamber. The first fluid chamber is vacuumized to have a first pressure, and the second fluid chamber is also vacuumized to have a second pressure which is lower than the first pressure. The first and second fluid chambers work together to enhance the sealing performance of the sealing mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.