Exposure apparatus, control method for the same, and device manufacturing method
US7468783B2 · kind B2 · utility
1Cited by
4References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 30, 2007 |
| Grant date | Dec 23, 2008 |
| Priority date | — |
| Expiry date | Nov 30, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70733
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus which can change a reticle efficiently with a simple arrangement is provided. When changing the reticle, a table is moved to a predetermined change operation position. At this time, a second magnet is retreated to a position where a repulsion force generated by a first magnet and the second magnet does not act on the table. After the reticle is changed, the second magnet is restored to a position where a repulsion force generating unit exerts a repulsion force upon the table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.