Fabrication method for arranging ultra-fine particles
US7470954B2 · kind B2 · utility
43Cited by
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14Claims
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Key dates
| Filing date | Nov 14, 2005 |
| Grant date | Dec 30, 2008 |
| Priority date | — |
| Expiry date | Nov 14, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F1/15316
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.