Patent · US Expired

X-ray source provided with a liquid metal target

US7471769B2 · kind B2 · utility

3Cited by

7References

9Claims

0Family size

Assignee

KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

Geoffrey Harding · Hamburg, DE
Bernd David · Henstedt-Ulzburg, DE
Rainer Eckart · Hamburg, DE
Jens-Peter Schlomka · Hamburg, DE

Key dates

Filing date	Jun 20, 2002
Grant date	Dec 30, 2008
Priority date	—
Expiry date	Mar 11, 2023

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2235/082
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An X-ray source and an X-ray apparatus with an X-ray source are provided, the X-ray source includes a liquid metal target which flows through a system of ducts and is conducted through a duct section which has a flow cross-section that is reduced relative to that of the system of ducts. The X-ray source provides a pressure source for acting on the liquid metal target such that the pressure in the liquid metal target at the area of the reduced flow cross-section equals essentially a selectable reference value or remains essentially in a pressure range between selectable limit values of the pressure. A comparatively small thickness of a window can thus be realized in conjunction with a comparatively high flow speed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.