Patent · US Active

Method for fabricating a variable-resistance element including heating a RMCoO3 perovskite structure in an oxygen atmosphere

US7473612B2 · kind B2 · utility

2Cited by
2References
6Claims
0Family size

Assignee

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Key dates

Filing dateMay 4, 2006
Grant dateJan 6, 2009
Priority date
Expiry dateAug 8, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG11C2213/31
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method for fabricating a variable-resistance element, the resistance of a material layer being variable in accordance with an electric current or voltage applied across first and second electrodes, the method including: (1) a first electrode production step; (2) a step of forming the material layer on the first electrode, wherein the material layer comprises an oxide semiconductor having a perovskite structure represented by the chemical formula RMCoO3, wherein R is a rare-earth element and M is an alkaline-earth element; (3) an oxygen treatment step of heating the material layer in an oxygen atmosphere; (4) a step of forming the second electrode on the material layer that was subjected to the oxygen treatment step; and (5) a hydrogen treatment step of heating the material layer in a reducing atmosphere containing hydrogen.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.