Method for measurement of weight during a CVI/CVD process
US7476419B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2007 |
| Grant date | Jan 13, 2009 |
| Priority date | — |
| Expiry date | Jan 25, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S427/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of chemical vapor infiltration and deposition includes stacking a number of porous structures in a stack in a furnace. The stack has a center opening region extending through the porous structures and an outer region extending along the porous structures. A first portion of a reactant gas is introduced to the center opening region. A second portion of the reactant gas is introduced to the outer region. The first portion and the second portion are controlled proportions thereby introducing predetermined portions of the reactant gas to both the center opening region and the outer region. The change in weight of the entire furnace, including contents, is measured during the chemical vapor infiltration and deposition process. The rate of weight change is monitored.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.