UV decomposable molecules and a photopatternable monomolecular film formed therefrom
US7479362B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2005 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Jul 4, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C). Further, the invention can provide a method of forming a film pattern comprising; at least a step of ejecting a droplet, which includes a compound represented as the following Formula (0), on a solid-phase surface having a functional moiety:X—Y-Z (0)where, X represents a structure having reactivity to a functional moiety which exists at the solid-phase surface, Y represents a decomposable st…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.