E-beam vision system for monitoring and control
US7479632B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 27, 2006 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Apr 29, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3132
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of characterizing an electron beam is described, comprising providing a system including an electron gun having a steering coil. A material having a surface is also provided. An electron beam from said electron gun is directed to said surface. The directing includes providing a first current to the steering coil to direct the electron beam to a first point on the surface and then providing a second current to the steering coil to direct the electron beam to a second point on the surface. An imaging system is mounted for viewing said surface. An image is collected based on light emitted from the surface because of the electron beam directed at the first point and the second point. A light intensity is determined at the first point and at the second point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.