Patent · US Expired

Device and method for analyzing a materials library

US7479636B2 · kind B2 · utility

2Cited by

9References

6Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Gerd Scheying · Stuttgart, DE
Steffen Katzenberger · Bad Liebenzell, DE
Thomas Brinz · Bissingen, DE
Joerg Jockel · Gerlingen, DE

Key dates

Filing date	Jun 7, 2004
Grant date	Jan 20, 2009
Priority date	—
Expiry date	Nov 7, 2025

Classification

Technology area (CPC G)Physics
CPC primaryG01N21/3151
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A device for analyzing a materials library includes at least one radiation source for electromagnetic radiation, which is positioned in front of the materials library, and at least two flat detectors operating in parallel, which are operable using high-sensitivity resolution and of which one is sensitive to electromagnetic radiation of a first wavelength range and the other is sensitive to electromagnetic radiation of a second wavelength range. Moreover, a method for analyzing a materials library in which the materials library is simultaneously tested using at least two methods in which electromagnetic radiation of different wavelength ranges is used. The beam is split behind the materials library as a function of wavelength and is deflected in the direction of at least two flat sensors operating using high-sensitivity resolution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.